Case study: RLE20 interferometer enhances performance of Raith’s latest e-beam tool (pdf)
Raith's VB300 e-beam lithography tool is a development of the highly successful VB6 series introduced in 1993. In designing the new tool, Raith identified that a reduction of noise-induced positional errors would significantly improve tool performance. Through a combination of improved mechanical rigidity and integration of the Renishaw RLE20 differential interferometer based encoder system, these errors are now expected to be <3 nm.
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